Advances in Research and Development, Volume 23: Modeling of Film Deposition for Microelectronic Applications (Thin Films Vol. 23) Buy on Amazon
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Advances in Research and Development, Volume 23: Modeling of Film Deposition for Microelectronic Applications (Thin Films Vol. 23)

Publisher Academic Press
16.24 230.00 -93% USD

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Book Details
Publisher Academic Press
ISBN / ASIN 0125330235
ISBN-13 9780125330237
Availability Usually ships in 24 hours
Sales Rank #6,127,429
Marketplace United States 🇺🇸
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Description
Significant progress has occurred during the last few years in device technologies and these are surveyed in this new volume. Included are Si/(Si-Ge) heterojunctions for high-speed integrated circuits, Schottky-barrier arrays in Si and Si-Ge alloys for infrared imaging, III-V quantum-well detector structures operated in the heterodyne mode for high-data-rate communications, and III-V heterostructures and quantum-wells for infrared emissions.
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