{"version":"1.0","type":"rich","provider_name":"EbookNetworking","provider_url":"https://www.ebooknetworking.net","title":"Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics: Volume 567 (MRS Proceedings)","author_name":"Huff, H. R.","thumbnail_url":"https://www.ebooknetworking.net/books/155/899/big1558994742.jpg","thumbnail_width":330,"thumbnail_height":500,"html":"<a href=\"https://www.ebooknetworking.net/books_detail-1558994742.html\">Ultrathin SiO2 and High-K Materials for ULSI Gate Dielectrics: Volume 567 (MRS Proceedings)</a>","width":400,"height":300}