{"version":"1.0","type":"rich","provider_name":"EbookNetworking","provider_url":"https://www.ebooknetworking.net","title":"Nitrogen incorporation into high-k gate dielectrics: Evaluation of nitrogen incorporation effects in HfO2 and HfSiO gate dielectrics for improved MOSFET performance","author_name":"Hag-Ju Cho","thumbnail_url":"https://www.ebooknetworking.net/books/363/915/big3639157052.jpg","thumbnail_width":330,"thumbnail_height":500,"html":"<a href=\"https://www.ebooknetworking.net/books_detail-3639157052.html\">Nitrogen incorporation into high-k gate dielectrics: Evaluation of nitrogen incorporation effects in HfO2 and HfSiO gate dielectrics for improved MOSFET performance</a>","width":400,"height":300}