{"version":"1.0","type":"rich","provider_name":"EbookNetworking","provider_url":"https://www.ebooknetworking.net","title":"Evaluation of protection schemes for extreme ultraviolet lithography (EUVL) masks against top-down aerosol flow [An article from: Journal of Aerosol Science]","author_name":"S.-J. Yook, H. Fissan, C. Asbach, J. Hyeun Kim, Wa","thumbnail_url":"https://www.ebooknetworking.net/books/B00/0PD/bigB000PDSLTY.jpg","thumbnail_width":330,"thumbnail_height":500,"html":"<a href=\"https://www.ebooknetworking.net/books_detail-B000PDSLTY.html\">Evaluation of protection schemes for extreme ultraviolet lithography (EUVL) masks against top-down aerosol flow [An article from: Journal of Aerosol Science]</a>","width":400,"height":300}