Contents
- Preface
- Resolution and Lithography
- Moore's Law
- Optical Process/Proximity Correction (OPC)
- Phase-Shifting Masks (PSM)
- Off-Axis Illumination (OAI)
- Computer-Aided Design (CAD)
- Other Resolution Enhancement Techniques
Selected Papers on Resolution Enhancement Techniques in Optical Lithography (SPIE Milestone Series Vol. MS178)
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Book Details
Author(s)F. M. Schellenberg
PublisherSPIE Press
ISBN / ASIN0819451665
ISBN-139780819451668
AvailabilityUsually ships in 24 hours
Sales Rank7,097,585
MarketplaceUnited States 🇺🇸
Description ▲
Optical lithography for integrated circuits is undergoing a renaissance with the adoption of Resolution Enhancement Technology (RET). Some RET concepts have become routine in manufacturing. This volume gathers together seminal RET papers.