Deposition of zinc oxide by dielectric barrier discharge: Deposit zinc oxide thin film at atmospheric pressure using dielectric barrier discharge

Zinc oxide is a potential material for many industries ranging from paints to electronics. This monograph discusses about a new approach to deposit zinc oxide on silicon wafer with an aim to produce transparent conducting oxide layer of a solar cell. This book discusses the theory related to the deposition process and experimental approach along with the associated results. After deposition characterization of the coating which includes state of the art scanning electron microscopy (SEM) and X-ray photo electron spectroscopy (XPS) is presented in the result and discussion section. The literature will give a clear idea to the readers about the associated theory, experiment and characterization of the dielectric barrier assisted zinc oxide thin film deposition. The book also discusses about the future scope of the experiment for those who are interested in further research on this topic.