Both conventional and non-conventional fabrication technologies are introduced with emphasis on multidisciplinary principles, methodologies, and practical applications. While conventional technologies consider the emerging techniques developed for next generation lithography, non-conventional techniques include scanning probe microscopy lithography, self-assembly, and imprint lithography, as well as techniques specifically developed for making carbon tubes and molecular circuits and devices.
Contents:
- Atomic Force Microscope Lithography (N Kawasegi et al.);
- Nanowire Assembly and Integration (Z Gu & D H Gracias);
- Extreme Ultraviolet Lithography (H Kinoshita);
- Electron Projection Lithography (T Miura et al.);
- Electron Beam Direct Writing (K Yamazaki);
- Electron Beam Induced Deposition (K Mitsuishi);
- Focused Ion Beams and Interaction with Solids (T Ishitani et al.);
- Nanofabrication of Nanoelectromechanical Systems (NEMS): Emerging Techniques (K L Ekinci & J Brugger);
- and other papers.