CVD of SiC and AlN Thin Films Using Designed Organometallic Precursors

Name: CVD of SiC and AlN Thin Films Using Designed Organometallic Precursors
Author: Leonard V. Interrante
ISBN: 978B00CZXJ1L1

Publisher PN

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Book Details

PublisherPN

ISBN / ASINB00CZXJ1LO

ISBN-13978B00CZXJ1L1

MarketplaceFrance 🇫🇷