Ion Beam Induced Nanoscale Ripples on Si, TiO2 and Ti Surfaces Buy on Amazon

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Ion Beam Induced Nanoscale Ripples on Si, TiO2 and Ti Surfaces

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Book Details

ISBN / ASIN3659488135
ISBN-139783659488139
AvailabilityUsually ships in 24 hours
Sales Rank8,992,431
MarketplaceUnited States  🇺🇸

Description

In this work the roughening effect of grazing incidence ion-bombardment on a variety of inorganic surfaces is discussed. With a combination of experimental and theoretical investigations, the dynamic formation of nanoscopic periodic surface ripples is described as function of incident angle, ion fluence and temperature. Our results show the universality of the ripple formation on semiconducting, metallic and insulating surfaces. Among numerous promising applications, this research establishes the ion-bombardment technique as a valid bottom-up method for nano-patterning to be used as a cost-efficient alternative to conventional top-down lithography in semiconductors technology.
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