Crosslinking in halogen containing novolac electron beam negative resists.: An article from: Polymer Engineering and Science
Book Details
Author(s)I.V. Lampe, M. Reinhardt
PublisherSociety of Plastics Engineers, Inc.
ISBN / ASINB00093HUVU
ISBN-13978B00093HUV2
AvailabilityAvailable for download now
Sales Rank99,999,999
MarketplaceUnited States 🇺🇸
Description
This digital document is an article from Polymer Engineering and Science, published by Society of Plastics Engineers, Inc. on January 1, 1995. The length of the article is 1210 words. The page length shown above is based on a typical 300-word page. The article is delivered in HTML format and is available in your Amazon.com Digital Locker immediately after purchase. You can view it with any web browser.
From the author: Halogenophenol novolac (HPN)-based negative resists exhibit excellent sensitivity and pattern resolution properties. The HPNs act as synergists for crosslinking with other irradiation labile compounds such as naphthoquinone diazide and bisazide vs. hydrogen halide (HX) elimination reaction, resulting in additional crosslinking, probably by aryl radical recombination and/or addition. We describe a new resist formulation based on HPN binder and melamine crosslinker (Cymel 303). In this case the irradiation induced HX elimination additionally catalyzes the melamine crosslinking.
Citation Details
Title: Crosslinking in halogen containing novolac electron beam negative resists.
Author: I.V. Lampe
Publication:Polymer Engineering and Science (Refereed)
Date: January 1, 1995
Publisher: Society of Plastics Engineers, Inc.
Volume: v35 Issue: n2 Page: p180(4)
Distributed by Thomson Gale
From the author: Halogenophenol novolac (HPN)-based negative resists exhibit excellent sensitivity and pattern resolution properties. The HPNs act as synergists for crosslinking with other irradiation labile compounds such as naphthoquinone diazide and bisazide vs. hydrogen halide (HX) elimination reaction, resulting in additional crosslinking, probably by aryl radical recombination and/or addition. We describe a new resist formulation based on HPN binder and melamine crosslinker (Cymel 303). In this case the irradiation induced HX elimination additionally catalyzes the melamine crosslinking.
Citation Details
Title: Crosslinking in halogen containing novolac electron beam negative resists.
Author: I.V. Lampe
Publication:Polymer Engineering and Science (Refereed)
Date: January 1, 1995
Publisher: Society of Plastics Engineers, Inc.
Volume: v35 Issue: n2 Page: p180(4)
Distributed by Thomson Gale
