Behavior in the vicinity of a moving exposed region.(A Process Model for Nonisothermal Photopolymerization With a Laser Light Source, part 2): An article from: Polymer Engineering and Science
Book Details
Author(s)Lawrance Flach, Richard P. Chartoff
PublisherSociety of Plastics Engineers, Inc.
ISBN / ASINB00093KTNG
ISBN-13978B00093KTN2
AvailabilityAvailable for download now
Sales Rank99,999,999
MarketplaceUnited States 🇺🇸
Description
This digital document is an article from Polymer Engineering and Science, published by Society of Plastics Engineers, Inc. on March 1, 1995. The length of the article is 3609 words. The page length shown above is based on a typical 300-word page. The article is delivered in HTML format and is available in your Amazon.com Digital Locker immediately after purchase. You can view it with any web browser.
From the author: A mathematical process model that stimulates important aspects of stereolithography, a rapid prototyping technique used for the production of three-dimensional plastic parts, has been developed. The model consists of a set of coupled partial differential equations and considers irradiation, chemical reaction, and heat transfer in a vat of photomonomer exposed to a moving UV laser source. Laser motion occurs in a straight line (vector path), and the model thus simulates the production of a single strand of plastic. Numerical techniques are used for approximate solution of the model equations, and output includes spatial and temporal variations in conversion of monomer to polymer, depletion of photoinitiator, and variations of temperature along the line of exposed material. The formation of a temperature wave that moves along the line of plastic is observed, together with the fact that the leading edge of the wave is steeper than the trailing edge, i.e., the material heats considerably faster than it cools. The maximum temperature of the wave reaches a pseudo-steady state after a short time. The results have provided useful information concerning the temperature at which the majority of the polymerization occurs; provided information on overall transient temperature behavior; allowed computer prediction of stereolithography working curves (cure depth and cure width vs. laser scan rate); and afforded a means for evaluating the amount of reaction that occurs in the dark period after light exposure.
Citation Details
Title: Behavior in the vicinity of a moving exposed region.(A Process Model for Nonisothermal Photopolymerization With a Laser Light Source, part 2)
Author: Lawrance Flach
Publication:Polymer Engineering and Science (Refereed)
Date: March 1, 1995
Publisher: Society of Plastics Engineers, Inc.
Volume: v35 Issue: n6 Page: p493(6)
Distributed by Thomson Gale
From the author: A mathematical process model that stimulates important aspects of stereolithography, a rapid prototyping technique used for the production of three-dimensional plastic parts, has been developed. The model consists of a set of coupled partial differential equations and considers irradiation, chemical reaction, and heat transfer in a vat of photomonomer exposed to a moving UV laser source. Laser motion occurs in a straight line (vector path), and the model thus simulates the production of a single strand of plastic. Numerical techniques are used for approximate solution of the model equations, and output includes spatial and temporal variations in conversion of monomer to polymer, depletion of photoinitiator, and variations of temperature along the line of exposed material. The formation of a temperature wave that moves along the line of plastic is observed, together with the fact that the leading edge of the wave is steeper than the trailing edge, i.e., the material heats considerably faster than it cools. The maximum temperature of the wave reaches a pseudo-steady state after a short time. The results have provided useful information concerning the temperature at which the majority of the polymerization occurs; provided information on overall transient temperature behavior; allowed computer prediction of stereolithography working curves (cure depth and cure width vs. laser scan rate); and afforded a means for evaluating the amount of reaction that occurs in the dark period after light exposure.
Citation Details
Title: Behavior in the vicinity of a moving exposed region.(A Process Model for Nonisothermal Photopolymerization With a Laser Light Source, part 2)
Author: Lawrance Flach
Publication:Polymer Engineering and Science (Refereed)
Date: March 1, 1995
Publisher: Society of Plastics Engineers, Inc.
Volume: v35 Issue: n6 Page: p493(6)
Distributed by Thomson Gale
