The influence of inorganic oxidants and metal ions on semiconductor sensitized photodegradation of 4-fluorophenol [An article from: Chemical Engineering Journal]

This digital document is a journal article from Chemical Engineering Journal, published by Elsevier in 2007. The article is delivered in HTML format and is available in your Amazon.com Media Library immediately after purchase. You can view it with any web browser.

Description:
This paper mainly focuses on the influence of inorganic oxidants and metal ions on the TiO"2, ZnO sensitized photodegradation of 4-fluorophenol (4-FP) by UV-A light. TiO"2-P25 is more efficient than ZnO. Among the oxidants periodate ion was found to be more efficient than others in improving the degradation of 4-FP via formation of reactive radicals. The effect of oxidants on the degradation of 4-FP was found to be in the order of IO"4^->BrO"3^->S"2O"8^2^- H"2O"2>ClO"3^-. The effect of metal ions on degradation of 4-FP was found to be in the order of Mg^2^+>Fe^3^+>Fe^2^+>Cu^2^+. The degradation of 4-FP follows pseudo-first order kinetics according to the Langmuir-Hinshelwood model. The photomineralisation has also been confirmed by COD, gas chromatography and fluoride ion measurements.