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An improved alignment layer grown by oblique evaporation for liquid crystal devices [An article from: Displays]
Description
This digital document is a journal article from Displays, published by Elsevier in . The article is delivered in HTML format and is available in your Amazon.com Media Library immediately after purchase. You can view it with any web browser.
Description:
In this paper, we present a new approach to aligning liquid crystal (LC) molecules on thin SiO"2 films. The SiO"2 film is obliquely deposited using electron beam evaporation. The effectiveness of the oblique SiO"2 films is determined through measurements of optical and electrical properties. The columnar topography of the SiO"2 alignment layer is observed using atomic force microscope (AFM) images. Using an oblique deposition angle of 35^o, the deposited SiO"2 films reach optimal surface morphology regarding transmittance (92.4%) and roughness (1.643nm). With this new optimal film, LCD applications show improvements in response time and contrast ratio when compared to LCD applications, which use the typical 90^o deposition method. The improvements are about 135 and 40%, respectively.
Description:
In this paper, we present a new approach to aligning liquid crystal (LC) molecules on thin SiO"2 films. The SiO"2 film is obliquely deposited using electron beam evaporation. The effectiveness of the oblique SiO"2 films is determined through measurements of optical and electrical properties. The columnar topography of the SiO"2 alignment layer is observed using atomic force microscope (AFM) images. Using an oblique deposition angle of 35^o, the deposited SiO"2 films reach optimal surface morphology regarding transmittance (92.4%) and roughness (1.643nm). With this new optimal film, LCD applications show improvements in response time and contrast ratio when compared to LCD applications, which use the typical 90^o deposition method. The improvements are about 135 and 40%, respectively.
