https://www.ebooknetworking.net/books_detail-1243426802.html

Design of atmospheric pressure plasma CVD process for deposition of silicon nitride thin films using dielectric barrier discharge.

Name: Design of atmospheric pressure plasma CVD process for deposition of silicon nitride thin films using dielectric barrier discharge.
Author: Shunfu Hu
ISBN: 9781243426802

AuthorShunfu Hu

PublisherProquest, Umi Dissertation Publishing

Shop on Amazon — choose your country

🇺🇸 USA 🇨🇦 Canada 🇬🇧 UK 🇩🇪 Germany 🇫🇷 France 🇮🇳 India

Buy New on Amazon 🇬🇧

Book Details

Author(s)Shunfu Hu

PublisherProquest, Umi Dissertation Publishing

ISBN / ASIN1243426802

ISBN-139781243426802

MarketplaceUnited Kingdom 🇬🇧

Description

Book by Hu, Shunfu